| Budget Amount *help |
¥18,850,000 (Direct Cost: ¥14,500,000、Indirect Cost: ¥4,350,000)
Fiscal Year 2013: ¥5,460,000 (Direct Cost: ¥4,200,000、Indirect Cost: ¥1,260,000)
Fiscal Year 2012: ¥5,460,000 (Direct Cost: ¥4,200,000、Indirect Cost: ¥1,260,000)
Fiscal Year 2011: ¥7,930,000 (Direct Cost: ¥6,100,000、Indirect Cost: ¥1,830,000)
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| Research Abstract |
Damage-free processing of organic materials with mesoscopic cluster ion beam was developed using pickup cell and by controlling charge state, cluster-size, and environment gas during irradiations. An in-situ XPS system connected to cluster ion beam system was used for damage evaluation of organic materials. It has been clarified that low-ionization voltage is required to suppress formation of multiply charged cluster ions. Besides, large cluster ions, and control of environment gas during irradiation is effective for low-damage processing of organic materials.
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