2004 Fiscal Year Final Research Report Summary
Clustering reaction control in plasma CVD for fabricating high efficiency solar cells
Project/Area Number |
14205047
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Research Category |
Grant-in-Aid for Scientific Research (A)
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Allocation Type | Single-year Grants |
Section | 一般 |
Research Field |
Electronic materials/Electric materials
|
Research Institution | KYUSHU UNIVERSITY |
Principal Investigator |
YUKIO Watanabe Kyushu University, Department of Electronics, Professor, 大学院・システム情報科学研究院・電子デバイス部門, 教授 (80037902)
|
Co-Investigator(Kenkyū-buntansha) |
SHIRATANI Masaharu KYUSHU UNIVERSITY, Department of electrorics, Associate Professor, 助教授 (90206293)
KOGA Kazunori KYUSHU UNIVERSITY, Department of electronics, Research Associate, 助手 (90315127)
|
Project Period (FY) |
2002 – 2004
|
Keywords | amorphous silicon / clustering reaction control in plasma CVD / silicon particle / thin film solar cell / light induced degradation / cluster eliminating filter / multi-hollow discharge / higher order silane |
Research Abstract |
We have developed clustering reaction control in plasma CVD for fabricating high efficiency a-Si:H solar cells. Following results are obtained in this study. 1.We have developed a filter for eliminating cluster contribution to films. We have suppressed the contribution to films 1/100 times as low as that to conventional device quality films. 2.We have succeeded in depositing a-Si:H films which show little light induced defects by using the filter together with a cluster-suppressed plasma CVD. 3.We have developed multi-hollow discharges for realizing cluster-free a-Si:H. 4.We have succeeded in fabricating a Ni/a-Si:H/n^+ c-Si Schottkey cell which has a littile light induced degradation of 4%. These results indicates that suppression of contribution of clusters to films is the key to stable high efficiency a-Si:H solar cell.
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Research Products
(10 results)