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2017 Fiscal Year Final Research Report

Fabrication of tensile-strained single-crystalline GeSn wires on an insulator by lateral liquid-phase epitaxy towards electronic and opto-electronic device applications

Research Project

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Project/Area Number 15H03975
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section一般
Research Field Electronic materials/Electric materials
Research InstitutionOsaka University

Principal Investigator

Shimura Takayoshi  大阪大学, 工学研究科, 准教授 (90252600)

Co-Investigator(Renkei-kenkyūsha) WATABABE Heiji  大阪大学, 大学院工学研究科, 教授 (90379115)
HOSOI Takuji  大阪大学, 大学院工学研究科, 助教 (90452466)
Project Period (FY) 2015-04-01 – 2018-03-31
Keywords電気・電子材料 / 作成・評価技術 / エピタキシャル成長 / 半導体 / ゲルマニウム / シリコンフォトニクス
Outline of Final Research Achievements

We have fabricated GeSn wires by liquid-phase epitaxy during rapid thermal annealing. The field effect transistor with the GeSn wires exhibited field effect hole mobility of 423 cm2/Vs. The GeSn pn-photodiode showed good optical response for 1.55 um wavelength.

Free Research Field

電子デバイス材料

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Published: 2019-03-29  

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