Budget Amount *help |
¥26,520,000 (Direct Cost: ¥20,400,000、Indirect Cost: ¥6,120,000)
Fiscal Year 2013: ¥5,070,000 (Direct Cost: ¥3,900,000、Indirect Cost: ¥1,170,000)
Fiscal Year 2012: ¥12,220,000 (Direct Cost: ¥9,400,000、Indirect Cost: ¥2,820,000)
Fiscal Year 2011: ¥9,230,000 (Direct Cost: ¥7,100,000、Indirect Cost: ¥2,130,000)
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Research Abstract |
Laser-assisted chemical vapor deposition using electro-sprayed nano-droplets as source has been newly developed. In this process, decrease of a surface temperature caused by vaporization of solvents and source molecules can be suppressed by direct energy supply to the surface by laser, and homogenization reaction in gas phase vapor can also be suppressed by electrostatic repulsion of charged droplets. Consequently as a result, a source yield and a deposition rate was much improved comparing to a conventional CVD.
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