Development and Application of Bulk Sensitivity Controllable Atomic Structure Analysis Method by "Inverse Photoelectron Diffraction"(Fostering Joint International Research)

2017 Fiscal Year Final Research Report

• Project/Area Number: 15KK0167
• Research Category: Fund for the Promotion of Joint International Research (Fostering Joint International Research)
• Allocation Type: Multi-year Fund
• Research Field: Condensed matter physics I
• Research Institution: Nara Institute of Science and Technology
• Principal Investigator: Matsui Fumihiko 奈良先端科学技術大学院大学, 物質創成科学研究科, 准教授 (60324977)
• Research Collaborator: Muntwiler Matthias Paul Scherrer Institut, Swiss Light Source, Dr. ; Greber Thomas University of Zurich, Physik-Institut, Prof.
• Project Period (FY): 2016 – 2017
• Keywords: 光電子回折 / Auger電子回折 / 原子構造 / 放射光・軟X線 / 表面・界面 / 非弾性散乱過程

Outline of Final Research Achievements

Quantitative understanding of negative contrast pattern of photoelectron diffraction pattern in energy loss electron angle distribution, development of detectors for such phenomena, and application to bulk and surface atomic structure analysis, were pursued in the framework of the present international collaborative research. In this project, energy loss electron angle distribution was measured with high energy resolution. This experiment was carried out with a beamline dedicated to photoelectron diffraction of the synchrotron radiation facility in Switzerland. We believe that we achieved in contributing to the improvement of the reliability of local atomic structure analysis by showing the importance of appropriately removing the background of energy loss electron diffraction from photoelectron diffraction. Through international collaborative research, we have disseminated such knowledge.

Free Research Field

表面物性物理学