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2012 Fiscal Year Final Research Report

Mechanism of oxygen transportation in Czochralski Ge crystal growth from the melt covered by B_2O_3

Research Project

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Project/Area Number 22686002
Research Category

Grant-in-Aid for Young Scientists (A)

Allocation TypeSingle-year Grants
Research Field Applied materials science/Crystal engineering
Research InstitutionShinshu University

Principal Investigator

TAISHI Toshinori  信州大学, 工学部, 准教授 (90397307)

Co-Investigator(Renkei-kenkyūsha) YONENAGA Ichiro  東北大学, 金属材料研究所, 教授 (20134041)
HOSHIKAWA Keigo  信州大学, 工学部, 客員教授 (10231573)
Project Period (FY) 2010 – 2012
Keywords結晶成長 / 結晶評価
Research Abstract

Mechanism of oxygen transportation in Czochralski germanium (Ge) crystal growth from the melt covered by B_2O_3 was investigated. Ge crystals with high oxygen concentration up to were successfully grown from the melt fully covered by B_2O_3. In such growth, GeO_2 particles is decomposed by B_2O_3, however, few B and Si atoms were contaminated in the Ge melt and the grown crystal. Dissolution, evaporation and segregation of oxygen in the present growth were also discussed, finally, transportation of oxygen during the growth was clarified.

  • Research Products

    (26 results)

All 2013 2012 2011 2010 Other

All Journal Article (11 results) (of which Peer Reviewed: 8 results) Presentation (13 results) Book (1 results) Remarks (1 results)

  • [Journal Article] Interstitial oxygen behavior for thermal double donor formation in germanium: Infrared absorption studies2013

    • Author(s)
      K. Inoue, T. Taishi, Y. Tokumoto, Y. Murao, K.Kutsukake, Y. Ohno, M. Suezawa, I.Yonenaga
    • Journal Title

      J. Appl. Phys.

      Volume: 113 Pages: 073501 (1-5)

    • DOI

      DOI:10.1063/1.4792061

    • Peer Reviewed
  • [Journal Article] Characteristics of germanium crystals doped with boron-related compounds2012

    • Author(s)
      T. Taishi, Y. Murao, I. Yonenaga, K. Hoshikawa
    • Journal Title

      The 6th International Symposium on Advanced Science and Technology of Sillicon Materials

      Pages: 71-74

  • [Journal Article] Oxygen in Ge crystals grown by the B_2O_3 encapsulated Czochralski method2012

    • Author(s)
      I. Yonenaga, T. Taishi, H. Ise, Y. Murao, K. Inoue, T. Ohsawa, Y. Tokumoto, Y. Ohno, Y. Hashimoto
    • Journal Title

      Physica B

      Volume: 407 Pages: 2932-2934

    • DOI

      DOI:10.1016/j.physb.2011.08.038

    • Peer Reviewed
  • [Journal Article] Czochralski growth techniques of germanium crystals grown from a melt covered partially or fully by liquid B_2O_32012

    • Author(s)
      T. Taishi, Y. Hashimoto, H. Ise, Y. Murao, T.Ohsawa, I. Yonenaga
    • Journal Title

      J. Cryst. Growth

      Volume: 360 Pages: 47-51

    • DOI

      DOI:10.1016/j.jcrysgro.2011.11.051

    • Peer Reviewed
  • [Journal Article] 液状酸化ホウ素(B_2O_3)を用いた無転位・酸素添加ゲルマニウム結晶の育成2011

    • Author(s)
      太子敏則, 米永一郎
    • Journal Title

      まてりあ

      Volume: 50 Pages: 431-438

    • Peer Reviewed
  • [Journal Article] Impurity effects on the generation and velocity of dislocations in Ge2011

    • Author(s)
      Y. Murao, T. Taishi, Y. Tokumoto, Y. Ohno , I. Yonenaga
    • Journal Title

      J. Appl. Phys

      Volume: 109 Pages: 113502(1-5)

    • DOI

      DOI:10.1063/1.3592226

    • Peer Reviewed
  • [Journal Article] Behavior of oxygen-related thermal donors in Ge crystals Czochralski-grown from the melt covered fully by B_2O_32011

    • Author(s)
      T. Taishi, Y. Hashimoto, H. Ise, Y. Murao, T. Ohsawa, Y. Tokumoto, Y. Ohno, I. Yonenaga
    • Journal Title

      J. Phys. Conf. Ser

      Volume: 281 Pages: 012011(1-6)

    • DOI

      DOI:10.1088/1742-6596/281/1/012011

    • Peer Reviewed
  • [Journal Article] Oxygen doped Ge crystals Czochralski-grown from the B_2O_3-fully -covered melt2011

    • Author(s)
      T. Taishi, H. Ise, Y. Murao, T. Ohsawa, Y. Tokumoto, Y. Ohno, I. Yonenaga
    • Journal Title

      Miroelectro. Eng

      Volume: 88 Pages: 496-498

    • DOI

      DOI:10.1016/j.mee.2010.10.015

    • Peer Reviewed
  • [Journal Article] Evaluations of oxygen impurities in Ge crystals Czochralski-grown from melts partially or fully covered by B_2O_3 liquid, Proc2010

    • Author(s)
      T. Taishi, Y. Hashimoto, H. Ise, Y. Murao, T. Ohsawa, Y. Tokumoto, Y. Ohno, I. Yonenaga
    • Journal Title

      The Forum on the Science and Technology of Silicon Materials

      Pages: 28-33

  • [Journal Article] Czochralski growth of Ge crystal from the melt partially covered by B_2O_3 liquid for reduction of dislocation density2010

    • Author(s)
      T. Taishi, Y. Hashimoto, H. Ise, Y. Murao, T. Ohsawa, Y. Tokumoto, Y. Ohno, I. Yonenaga
    • Journal Title

      Proc. The Forum on the Science and Technology of Silicon Materials

      Pages: 426-432

  • [Journal Article] Czochralski -growth of germanium crystals containing high concen-trations of oxygen impurities2010

    • Author(s)
      T. Taishi, H. Ise, Y. Murao, T. Ohsawa, M. Suezawa, Y. Tokumoto, Y. Ohno, K. Hoshikawa, I. Yonenaga
    • Journal Title

      J. Cryst. Growth

      Volume: 312 Pages: 2783-2787

    • DOI

      DOI:10.1016/j.jcrysgro.2010.05.045

    • Peer Reviewed
  • [Presentation] B_2O_3で覆われた融液からのCZ-Ge結晶育成における酸素の偏析2013

    • Author(s)
      太子敏則, 米永一郎, 干川圭吾
    • Organizer
      第60回応用物理学会春季学術講演会
    • Place of Presentation
      厚木
    • Year and Date
      2013-03-30
  • [Presentation] Growth and characterization of germanium crystals from B_2O_3-coverd melt2012

    • Author(s)
      T. Taishi
    • Organizer
      2012 3CG Collaborative Conference on Crystal Growth
    • Place of Presentation
      Orlando, USA.(invited)
    • Year and Date
      2012-12-10
  • [Presentation] Characteristics of germanium crystals doped with boron-related compounds2012

    • Author(s)
      T. Taishi, Y. Murao, I. Yonenaga, K. Hoshikawa
    • Organizer
      The 6th International Symposium on Advanced Science and Technology of Silicon Materials
    • Place of Presentation
      Cona, Hawaii
    • Year and Date
      2012-11-21
  • [Presentation] 液状B_2O_3で覆った融液から育成したCZ-Ge結晶中の欠陥評価2012

    • Author(s)
      太子敏則
    • Organizer
      第22回格子欠陥フォーラム・励起ナノプロセス研究会・理研シンポジウム合同シンポジウム「材料科学のための欠陥制御・評価」
    • Place of Presentation
      三浦
    • Year and Date
      2012-09-22
  • [Presentation] B_2O_3で覆われた融液からのCZ- Ge結晶育成におけるB、 Si、 Oの反応2012

    • Author(s)
      太子敏則,米永一郎,干川圭吾
    • Organizer
      第73回応用物理学会学術講演会
    • Place of Presentation
      松山
    • Year and Date
      2012-09-14
  • [Presentation] CZ-Ge結晶成長における酸素添加と酸素ドナー挙動2011

    • Author(s)
      太子敏則, 橋本佳男, 伊勢秀彰, 大澤隆亨, 村尾優, 米永一郎
    • Organizer
      第41回結晶成長国内会議
    • Place of Presentation
      つくば
    • Year and Date
      20111103-05
  • [Presentation] Growth of dislocation-free Ga-doped Ge crystals using boron oxide for solar cells2011

    • Author(s)
      T. Taishi, Y. Hashimoto, Y. Murao, T. Ohsawa, I. Yonenaga
    • Organizer
      The 7th International Conference on Silicon Epitaxy and Heterostructure
    • Place of Presentation
      Leuven, Belgium
    • Year and Date
      20110828-0901
  • [Presentation] New Czochralski growth techniques of germaniumcrystals from the melt covered by B_2O_3 liquid2011

    • Author(s)
      T. Taishi, Y. Hashimoto, H. Ise, Y. Murao, T. Ohsawa, I. Yonenaga
    • Organizer
      The 5th International Workshop on Crystal Growth and Technology
    • Place of Presentation
      Berlin, Germany
    • Year and Date
      20110626-30
  • [Presentation] B_2O_3 で覆われた融液から成長したCZ-Ge 結晶中の酸素ドナーの挙動2011

    • Author(s)
      太子敏則, 橋本佳男, 伊勢秀彰, 大澤隆亨,米永一郎
    • Organizer
      第58回応用物理学関係連合講演会
    • Place of Presentation
      厚木
    • Year and Date
      2011-03-26
  • [Presentation] Evaluation of oxygen-related defects in Ge crystals grown from the melt covered by B_2O_32010

    • Author(s)
      T. Taishi, Y. Hashimoto, H. Ise, Y. Murao, T. Ohsawa, Y. Tokumoto, Y. Ohno, I. Yonenaga
    • Organizer
      The Forum on the Science and Technology of Silicon Materials 2010
    • Place of Presentation
      Okayama
    • Year and Date
      2010-11-15
  • [Presentation] Czochralski germanium crystal growth with low dislocation density and oxygen impurities2010

    • Author(s)
      T. Taishi
    • Organizer
      The Forum on the Science and Technology of Silicon Materials 2010
    • Place of Presentation
      Okayama. (invited)
    • Year and Date
      2010-11-15
  • [Presentation] B_2O_3 で覆われた融液から成長したCZ-Ge 結晶中の酸素の特徴2010

    • Author(s)
      太子敏則, 橋本佳男, 伊勢秀彰, 大澤隆亨, 米永一郎
    • Organizer
      第71回応用物理学会学術講演会
    • Place of Presentation
      長崎
    • Year and Date
      2010-09-01
  • [Presentation] Dislocation density and oxygen concentration in Czochralski germanium crystals grown using boron oxide2010

    • Author(s)
      T. Taishi, Y. Hashimoto, H. Ise, Y. Murao, T. Ohsawa, Y. Tokumoto, Y. Ohno, I. Yonenaga
    • Organizer
      The 16th International Conference on Crystal Growth
    • Place of Presentation
      Beijing, China
    • Year and Date
      2010-08-09
  • [Book] Germanium: Properties, Production and Applications2012

    • Author(s)
      T. Taishi, I. Yonenaga
    • Total Pages
      17
    • Publisher
      Growth of Ge crystals with extremely low dislocation density
  • [Remarks] 信州大学工学部干川・太子研究室ホームページの一部で紹介

    • URL

      http://www.shinshu-u.ac.jp/faculty/engineering/chair/hoshikawa-taishi/

URL: 

Published: 2014-08-29  

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